METHOD FOR DETERMINING MOIRE PATTERN, METHOD FOR SUPPRESSING MOIRE PATTERN AND CIRCUIT SYSTEM THEREOF

Patent №

US 11,488,286

Granted

2022-11-01

Filed 2020

Owner

REALTEK SEMICONDUCTOR CORP.

Lab

AI components

1

vision

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

17015131

A method for determining and suppressing Moiré pattern, and a circuit system thereof are provided. In the method, a brightness value of pixels of an image can be obtained. For each of the pixels of the image, a detection window is provided for calculating a Moiré pattern response value of a plurality of critical pixels and corresponding adjacent pixels. The critical pixels within the detection window are selected for determining a type of Moiré pattern. After, it is to compare the brightness values of the critical pixels and the corresponding adjacent pixels within the detection window. The comparison results can be used to determine the brightness characteristics of the pixels through a statistical method. Moiré pattern response value and the statistics are used to determine type and position of the Moiré pattern. A color noise suppression process is performed on the pixels to be determined as Moiré pattern.

VisionG06T 5/70G06T 7/0002G06T 7/73H04N 9/646H04N 9/78H04N 23/85G06T 2207/10024G06T 2207/30168

AI classification

Vision1.00
AI hardware0.17
Evolutionary computation0.00
Planning0.00
Machine learning0.00
Natural language0.00
Knowledge representation0.00
Speech0.00

Ownership

REALTEK SEMICONDUCTOR CORP.

assignment · 537170754

Assignors

HSIAO, CHING-JU, HUANG, WEN-TSUNG

On an employer assignment, the assignors are typically the inventors.

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