METHOD FOR DETERMINING MOIRE PATTERN, METHOD FOR SUPPRESSING MOIRE PATTERN AND CIRCUIT SYSTEM THEREOF
Patent №
US 11,488,286
Granted
2022-11-01
Filed 2020
Owner
REALTEK SEMICONDUCTOR CORP.
Lab
—
AI components
1
vision
Assignment
Recorded
Dataset
AIPD
2023_r1 edition
Application
17015131
A method for determining and suppressing Moiré pattern, and a circuit system thereof are provided. In the method, a brightness value of pixels of an image can be obtained. For each of the pixels of the image, a detection window is provided for calculating a Moiré pattern response value of a plurality of critical pixels and corresponding adjacent pixels. The critical pixels within the detection window are selected for determining a type of Moiré pattern. After, it is to compare the brightness values of the critical pixels and the corresponding adjacent pixels within the detection window. The comparison results can be used to determine the brightness characteristics of the pixels through a statistical method. Moiré pattern response value and the statistics are used to determine type and position of the Moiré pattern. A color noise suppression process is performed on the pixels to be determined as Moiré pattern.
AI classification
Ownership
REALTEK SEMICONDUCTOR CORP.
assignment · 537170754
Assignors
HSIAO, CHING-JU, HUANG, WEN-TSUNG
On an employer assignment, the assignors are typically the inventors.