METHOD FOR DETERMINING STOCHASTIC VARIATION OF PRINTED PATTERNS

Patent №

US 11,567,413

Granted

2023-01-31

Filed 2021

Owner

ASML NETHERLANDS B.V.

Lab

AI components

1

vision

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

17430517

A method for determining measurement data of a printed pattern on a substrate. The method involves obtaining (i) images of the substrate including a printed pattern corresponding to a reference pattern, (ii) an averaged image of the images, and (iii) a composite contour based on the averaged image. Further, the composite contour is aligned with respect to a reference contour of the reference pattern and contours are extracted from the images based on both the aligned composite contour and the output of die-to-database alignment of the composite contour. Further, the method determines a plurality of pattern measurements based on the contours and the measurement data corresponding to the printed patterns based on the plurality of the pattern measurements. Further, the method determines a one or more process variations such as stochastic variation, inter-die variation, intra-die variation and/or total variation.

VisionG03F 7/705G03F 7/70508G03F 7/70625G06T 7/001G06T 7/13G06T 7/181G06T 2207/10016G06T 2207/10061+2 more

AI classification

Vision1.00
Evolutionary computation0.01
Planning0.00
Natural language0.00
Machine learning0.00
Speech0.00
AI hardware0.00
Knowledge representation0.00

Ownership

ASML NETHERLANDS B.V.

assignment · 572620126

Assignors

WANG, CHANG AN, WANG, ALVIN JIANJIANG, LIANG, JIAO, WANG, JEN-SHIANG, FENG, MU

On an employer assignment, the assignors are typically the inventors.

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