Patent №
US 11,567,413
Granted
2023-01-31
Filed 2021
Owner
ASML NETHERLANDS B.V.
Lab
—
AI components
1
vision
Assignment
Recorded
Dataset
AIPD
2023_r1 edition
Application
17430517
A method for determining measurement data of a printed pattern on a substrate. The method involves obtaining (i) images of the substrate including a printed pattern corresponding to a reference pattern, (ii) an averaged image of the images, and (iii) a composite contour based on the averaged image. Further, the composite contour is aligned with respect to a reference contour of the reference pattern and contours are extracted from the images based on both the aligned composite contour and the output of die-to-database alignment of the composite contour. Further, the method determines a plurality of pattern measurements based on the contours and the measurement data corresponding to the printed patterns based on the plurality of the pattern measurements. Further, the method determines a one or more process variations such as stochastic variation, inter-die variation, intra-die variation and/or total variation.
AI classification
Ownership
ASML NETHERLANDS B.V.
assignment · 572620126
Assignors
WANG, CHANG AN, WANG, ALVIN JIANJIANG, LIANG, JIAO, WANG, JEN-SHIANG, FENG, MU
On an employer assignment, the assignors are typically the inventors.