Patent №
US 12,663,579
Granted
2026-06-23
Filed 2024
Owner
Taiwan Semiconductor Manufacturing Co., Ltd.
Lab
—
AI components
0
Assignment
None on record
Dataset
AIPD
Application
18434636
Photonic device, system and methods of making photonic devices and systems, the method including: providing a substrate, forming an insulator layer over the substrate, depositing a plurality of waveguide layers and a plurality of insulator spacers at different vertical levels over the insulator layer, wherein adjacent waveguide layers in the plurality of waveguide layers are isolated by one or more insulator spacers in the plurality of insulator spacers, and forming a plurality of waveguide patterns at the plurality of waveguide layers, wherein at least two waveguide patterns at different vertical levels in the plurality of waveguide patterns are coupled.
Ownership
Taiwan Semiconductor Manufacturing Co., Ltd.