PHOTONIC DEVICE, SYSTEM AND METHOD OF MAKING SAME

Patent №

US 12,663,579

Granted

2026-06-23

Filed 2024

Owner

Taiwan Semiconductor Manufacturing Co., Ltd.

Lab

AI components

0

Assignment

None on record

Dataset

AIPD

Application

18434636

Photonic device, system and methods of making photonic devices and systems, the method including: providing a substrate, forming an insulator layer over the substrate, depositing a plurality of waveguide layers and a plurality of insulator spacers at different vertical levels over the insulator layer, wherein adjacent waveguide layers in the plurality of waveguide layers are isolated by one or more insulator spacers in the plurality of insulator spacers, and forming a plurality of waveguide patterns at the plurality of waveguide layers, wherein at least two waveguide patterns at different vertical levels in the plurality of waveguide patterns are coupled.

G02B 6/12002G02B 6/12004G06N 3/048G06N 3/0464G02B 6/122G02B 6/1223G02B 6/125G02B 6/13+8 more

Ownership

Taiwan Semiconductor Manufacturing Co., Ltd.

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