Patent US 4,095,891

A system for exposing photoresists "on-the-fly" is disclosed. The system incorporates a dye laser having an output pulse duration of less than about 250 nanoseconds to expose the photoresist while the photoresist is moving. Means are provided to synchronize the output of the laser to the motion of a photoresist coated surface and to insure spatial uniformity of energy across an object plane of an optical projection system.