DUAL LEVEL PATTERN RECOGNITION SYSTEM

Patent №

US 4,521,909

Granted

1985-06-04

Filed 1983

Owner

WANG LABORATORES, INC.

Lab

AI components

3

ml · vision · hardware

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

06538858

A pattern recognition system has both coarse and fine levels of analysis in which a coarse array representation of a workpiece pattern is formed and used to identify the workpiece pattern as either a referench character or as a member of an ambiguous set of reference characters which are represented by identical coarse array representations. At least portions of a fine array representation of a workpiece pattern which has been classified as a member of a set of reference characters are compared to corresponding portions of fine array representations of reference characters in the set identified by the classification. The pattern recognition system has a learning system through which reference characters may be introduced into the recognition system and through which a representation of a workpiece pattern which was not identified may be incorporated into an existing set of reference characters of the recognition system.

AI classification

Vision1.00
AI hardware1.00
Machine learning0.98
Planning0.17
Natural language0.11
Knowledge representation0.01
Evolutionary computation0.01
Speech0.00

Ownership

WANG LABORATORES, INC.

assignment · 42680434

Assignors

WANG, PATRICK S.

On an employer assignment, the assignors are typically the inventors.

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