PATTERN CHECKING APPARATUS

Patent №

US 4,628,531

Granted

1986-12-09

Filed 1984

Owner

HITACHI, LTD., A CORP. OF JAPAN

Lab

AI components

1

vision

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

06583867

A pattern checking apparatus carries out the detection of candidate defects through a primary selection with a sensitivity high enough to detect any existing defect, and then carries out a detailed analysis by a controlling processor for a pattern including the periphery of the detected candidate defect through a secondary selection in which a candidate defect which is not a defect in a practical sense is removed from candidates, so that only real defects are detected.

VisionG06T 7/001G01N 21/956G06T 2207/10056G06T 2207/30148

AI classification

Vision1.00
Planning0.03
AI hardware0.01
Knowledge representation0.01
Natural language0.00
Evolutionary computation0.00
Machine learning0.00
Speech0.00

Ownership

HITACHI, LTD., A CORP. OF JAPAN

assignment · 42350740

Assignors

OKAMOTO, KEIICHI, NAKAHATA, KOZO, MATSUYAMA, YUKIO, DOI, HIDEAKI, AIUCHI, SUSUMU, NOMOTO, MINEO

On an employer assignment, the assignors are typically the inventors.

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