APPARATUS AND METHOD FOR LOCATING TARGET AREA FOR ELECTRON MICRO- ANALYSIS

Target area on a specimen surface is located in an electron microanalyzer system that includes an electron energy analyzer and an analyzer detector. An electron gun impinges a rastering beam of incident electrons across the surface, a secondary electron detector provides corresponding signals for producing a scanning electron microscope image of the surface. Backscattered electrons effected from the incident electrons are passed through the analyzer for producing a further image that is superimposed on the SEM image to locate the target area to be subject to a separate microanalysis. Particularly for an electrically insulating specimen surface, the images are produced in a single frame of rastering, and surface area and beam current are sufficient to produce the images without substantial charge buildup.