Patent №
US 5,229,868
Granted
1993-07-20
Filed 1990
Owner
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
+1 more
Lab
—
AI components
1
vision
Assignment
Recorded
Dataset
AIPD
2023_r1 edition
Application
07571350
A correspondence relation between a structure of a bi-level pattern A and a structure of a bi-level pattern B is statistically learned by use of a learning high-density image. The bi-level pattern A forms a partial region of a low-density character and line image except a screened dot image. The bi-level pattern B forms a corresponding partial region of a desired high-density image. A judgement is made as to whether the low-density image is equal to or different from a screened dot image. Reference pixels are selected from the partial region of the low-density image. The low-density bi-level pattern A is converted into the high-density bi-level pattern B on the basis of a result of the learning by use of the selected reference pixels when the low-density image is different from a screened dot image. A pixel of the low-density image is repeated to convert the low-density image into the high-density image when the low-density image is equal to a screend dot image.
AI classification
Ownership
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
assignment · 54370433
MATSUSHITA GRAPHIC COMMUNICATION SYSTEMS, INC.
assignment · 54370433
Assignors
KANNO, YOSHIMITSU, KUROSAWA, TOSHIHARU, KAWAKAMI, HIDEHIKO, KOTERA, HIROAKI, TSUCHIYA, HIROYOSHI, OHIRA, HIDEAKI, HASHIZUME, MUTUO
On an employer assignment, the assignors are typically the inventors.