Patent №
US 5,283,746
Granted
1994-02-01
Filed 1993
Owner
NEC CORPORATION
Lab
—
AI components
2
ml · hardware
Assignment
Recorded
Dataset
AIPD
2023_r1 edition
Application
08023158
The use of neural networks has been employed to adjust processing during the fabrication of articles. For example, in the production of photolithographic masks by electron beam irradiation of a mask blank in a desired pattern, electrons scattered from the mask substrate cause distortion of the pattern. Adjustment for such scattering is possible during the manufacturing process by employing an adjustment function determined by a neural network whose parameters are established relative to a prototypical mask pattern.
AI classification
Ownership
NEC CORPORATION
assignment · 79350007