BAND MATCHING SYSTEM AND METHOD FOR ENABLING ACCURATE DETERMINATION OF A DISPARITY BETWEEN TWO SURFACES USING AN INTERFEROMETER

Patent №

US 5,535,002

Granted

1996-07-09

Filed 1995

Owner

AT&T IPM CORP.

Lab

AI components

1

vision

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

08429996

A band matching system and method (213a) enables accurate determination of a disparity between two surfaces using an interferometer. The band matching system and method (213a) can be implemented in an automatic inspection system (90) for contactlessly measuring undercut or protrusion of an optical fiber (26) relative to a surrounding support material (36) at the endface (79) of an optical fiber termination (37). The inspection system (90) measures an offset of the fringe (113') at the target (82) in the image in order to determine the disparity. In structure, the inspection system (90) has a measurement apparatus (91) with an interferometer (98) controlled by a machine vision system (92) for determining the degree of disparity. Further, the machine vision system (92) employs the band matching system and method (213a) for enhancing the performance of the inspection system (90) and the ultimate calculation of the disparity.

VisionG02B 6/3822G02B 6/3833

AI classification

Vision1.00
Evolutionary computation0.17
Planning0.03
Knowledge representation0.00
Machine learning0.00
AI hardware0.00
Natural language0.00
Speech0.00

Ownership

AT&T IPM CORP.

assignment · 76330718

Assignors

CSIPKES, ANDREI, PALMQUIST, JOHN MARK

On an employer assignment, the assignors are typically the inventors.

© 2026 NYSGPT2525 LLC