METHOD, APPARATUS AND SYSTEM FOR ANALYZING FAILURE OF MEASURED DEVICE

Patent №

US 6,031,985

Granted

2000-02-29

Filed 1997

Owner

MITSUBISHI DENKI KABUSHIKI KAISHA

Lab

AI components

1

vision

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

08778274

A method for analyzing failures and an apparatus for analyzing failures are provided in which failed portions can easily be specified with high precision in a short time by using an emission analyzing apparatus without analyzers depending on designers. The coordinates of an emitting portion on an emission image which is detected by an emission analyzing apparatus are automatically recognized (Step S5). The same coordinates are automatically converted into the coordinates on a layout pattern (data) (Step S7). An emitting portion on a layout pattern is automatically displayed (Step S11). The name of a node on a net list (data) of the emitting portion is automatically recognized according to the coordinates on the layout pattern (Step S12). The name of an emitting node is automatically displayed on a net list (Step S13). Furthermore, an emitting node on a circuit diagram (data) is automatically displayed as an emitting portion on a circuit diagram based on the emitting node name (Step S15).

AI classification

Vision0.99
Natural language0.01
Planning0.01
AI hardware0.00
Knowledge representation0.00
Machine learning0.00
Evolutionary computation0.00
Speech0.00

Ownership

MITSUBISHI DENKI KABUSHIKI KAISHA

assignment · 93910633

Assignors

YOSHIDA, EIJI

On an employer assignment, the assignors are typically the inventors.

© 2026 NYSGPT2525 LLC