SAMPLE ANALYZING APPARATUS

The invention provides a sample analyzing apparatus to identify a particle accurately, securely and rapidly. After a wafer is pre-aligned and its wafer number is read, a recipe is read. The wafer is carried to an XY stage and aligned. A wafer map is read and displayed. An operator specifies a particle desired to be analyzed of particles on the wafer and moves a stage so that that particle is just below an electron beam. A scanning electron beam is irradiated over the specified particle so as to form an SEM image. The SEM image is compared to a corresponding reference SEM image and a precision positioning of the specified particle is carried out. The electron beam is irradiated to the specified particle and an emitting characteristic X-ray is detected. Its spectrum is displayed. The spectrum is compared to the reference spectrum and then reference spectrums estimated to be the same are listed up.