ASYMMETRIC ORGANOCYCLOSILOXANES AND THEIR USE FOR MAKING ORGANOSILICON POLYMER LOW-K DIELECTRIC FILM
Patent №
US 6,572,923
Granted
2003-06-03
Filed 2002
Owner
BOC GROUP, INC., THE
Lab
—
AI components
1
hardware
Assignment
Recorded
Dataset
AIPD
2023_r1 edition
Application
10042889
Methods for synthesizing extra low-k CVD precursors and forming extra low-k dielectric films on the surfaces of semiconductors wafers and integrated circuits are disclosed. An asymmetric organocyclosiloxane compound is applied to the surface where it will react with and form a film that will have a dielectric constant, k, from 2.0 to 2.5.
AI hardwareC09D 4/00H01L 21/02126H01L 21/02216H01L 21/02274H10P 14/6336H10P 14/6686H10P 14/6922Y10T 428/31663
AI classification
AI hardware0.78
Natural language0.01
Machine learning0.00
Evolutionary computation0.00
Speech0.00
Vision0.00
Planning0.00
Knowledge representation0.00
Ownership
BOC GROUP, INC., THE
assignment · 127740801
Assignors
MA, CE, WANG, QING MIN
On an employer assignment, the assignors are typically the inventors.
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