WAFER INSPECTION USING OPTIMIZED GEOMETRY

The present invention pertains to an optical inspection system capable of obtaining very high signal-to-noise ratio data and that is capable of high speed scanning rates. The ability to obtain high signal-to-noise data is obtained by selecting parts of the scattering hemisphere where signal from a defect is high and noise due to scattering from wafers structures is low. One embodiment of the optical inspection system includes a set of lenses used to form an image of the inspected specimen at a Fourier plane with telecentric-in-object space imaging. Another embodiment of the optical inspection system includes a substantially hemispherical shaped mirror system that provides a large collection numerical aperture that allows for the collection of substantially all of the hemisphere of scattered light from an inspected specimen. The present invention also discloses techniques for enhancing the signal-to-noise ratio of image data received from the optical inspection system.