METHOD AND SYSTEM FOR MASK PATTERN CORRECTION

Patent №

US 6,764,795

Granted

2004-07-20

Filed 2002

Owner

TEXAS INSTRUMENTS INCORPORATED

Lab

AI components

1

nlp

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

10225743

A method and system for mask pattern correction are disclosed. A portion of a mask pattern is segmented into segments (22) that include a base segment (22a) and a relational segment (22b). The relational segment (22b) is matched with the base segment (22a). A proximity correction is determined for the base segment (22a), and a critical dimension correction is determined for the relational segment (22b). The critical dimension correction is determined with respect to the proximity correction of the matching base segment (22a).

AI classification

Natural language0.88
Planning0.27
Evolutionary computation0.01
Knowledge representation0.01
Speech0.00
Vision0.00
Machine learning0.00
AI hardware0.00

Ownership

TEXAS INSTRUMENTS INCORPORATED

assignment · 132350424

Assignors

ATON, THOMAS J., SOPER, ROBERT A.

On an employer assignment, the assignors are typically the inventors.

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