Patent №
US 6,804,572
Granted
2004-10-12
Filed 2000
Owner
LAM RESEARCH CORPORATION
Lab
—
AI components
1
ml
Assignment
Recorded
Dataset
AIPD
2023_r1 edition
Application
09609593
A method enhances a process and profile simulator algorithm to predict the surface profile that a given plasma process will create. The method first tracks an energetic particle and then records the ion fluxes produced by the energetic particle. A local etch rate and a local deposition rate are computed from neutral fluxes, surface chemical coverage, and surface material type that are solved simultaneously.
AI classification
Machine learning0.66
Vision0.04
Evolutionary computation0.02
AI hardware0.00
Natural language0.00
Speech0.00
Planning0.00
Knowledge representation0.00
Ownership
LAM RESEARCH CORPORATION
assignment · 111070711
Assignors
COOPERBERG, DAVID, VAHEDI, VAHID
On an employer assignment, the assignors are typically the inventors.
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