OPERATION MONITORING METHOD FOR TREATMENT APPARATUS

Patent №

US 7,054,786

Granted

2006-05-30

Filed 2003

Owner

TOKYO ELECTRON LIMITED

Lab

AI components

2

ml · planning

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

10332011

In an operation monitoring method according to the present invention, operation data of a plasma processing system (1) are detected for every wafer (W) by means of a plurality of detectors, and a principal component analysis using the operation data is carried out by means of a controller (10). An operation state of the plasma processing system (1) is evaluated by using the results of the principal component analysis.

Machine learningPlanningH01J 37/32935H01L 22/20H10P 74/23H01L 21/31116H10P 50/283

AI classification

Planning1.00
Machine learning0.80
Vision0.02
Evolutionary computation0.02
Natural language0.01
AI hardware0.00
Knowledge representation0.00
Speech0.00

Ownership

TOKYO ELECTRON LIMITED

assignment · 142120750

Assignors

SAKANO, SHINJI, SENDODA, TSUYOSHI

On an employer assignment, the assignors are typically the inventors.

From the same owner

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