DEVICE FOR DETERMINING THE MASK VERSION UTILIZED FOR EACH METAL LAYER OF AN INTEGRATED CIRCUIT
Patent №
US 7,120,886
Granted
2006-10-10
Filed 2003
Owner
STMICROELECTRONICS SA
Lab
—
AI components
1
hardware
Assignment
Recorded
Dataset
AIPD
2023_r1 edition
Application
10699613
A device for determining the version of metal mask utilized for producing a given metal layer (Metal3) in an integrated circuit including a plurality of metal layers (Metal0, . . . , Metal3), and any modification made to the given metal layer (Metal3) requiring generation of a new version of the corresponding metal mask. The device includes a cell (Cell) integrated into the metal layer (Metal3) including at least a first voltage source (Vdd) for supplying a first voltage level, at least a second voltage source (GND) for supplying a second voltage level, and an output bus composed of at least one conductor wire (S1, S2) connected selectively to one of the first and second voltage sources as a function of the version of metal mask used to produce the metal layer, so as to generate a binary output signal representative of the mask version utilized.
AI classification
Ownership
STMICROELECTRONICS SA
assignment · 144820304
Assignors
DELEULE, ARNAUD
On an employer assignment, the assignors are typically the inventors.