DEVICE FOR DETERMINING THE MASK VERSION UTILIZED FOR EACH METAL LAYER OF AN INTEGRATED CIRCUIT

Patent №

US 7,120,886

Granted

2006-10-10

Filed 2003

Owner

STMICROELECTRONICS SA

Lab

AI components

1

hardware

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

10699613

A device for determining the version of metal mask utilized for producing a given metal layer (Metal3) in an integrated circuit including a plurality of metal layers (Metal0, . . . , Metal3), and any modification made to the given metal layer (Metal3) requiring generation of a new version of the corresponding metal mask. The device includes a cell (Cell) integrated into the metal layer (Metal3) including at least a first voltage source (Vdd) for supplying a first voltage level, at least a second voltage source (GND) for supplying a second voltage level, and an output bus composed of at least one conductor wire (S1, S2) connected selectively to one of the first and second voltage sources as a function of the version of metal mask used to produce the metal layer, so as to generate a binary output signal representative of the mask version utilized.

AI hardwareG03F 1/38H01L 23/544H10W 46/00H01L 2223/5444H01L 2924/0002H10W 46/403

AI classification

AI hardware0.98
Vision0.02
Machine learning0.00
Speech0.00
Planning0.00
Evolutionary computation0.00
Natural language0.00
Knowledge representation0.00

Ownership

STMICROELECTRONICS SA

assignment · 144820304

Assignors

DELEULE, ARNAUD

On an employer assignment, the assignors are typically the inventors.

From the same owner

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