Patent №
US 7,180,585
Granted
2007-02-20
Filed 2004
Owner
LEICA MICROSYSTEMS SEMICONDUCTOR GMBH
Lab
—
AI components
1
vision
Assignment
Recorded
Dataset
AIPD
2023_r1 edition
Application
10846624
An apparatus for wafer inspection is described, comprising an incident-light illumination device (5) having an illumination axis and an imaging device (9) having an image axis, both of which are inclined with respect to one another and are directed onto a region to be inspected of the surface (42) of a wafer (2). According to the present invention, the apparatus is characterized in that the incident-light illumination device (5) and the imaging device (9, 19) each have associated with them a polarizing means whose transmission axes are oriented at a predetermined angle to one another.
AI classification
Ownership
LEICA MICROSYSTEMS SEMICONDUCTOR GMBH
assignment · 153400538
Assignors
KREH, ALBERT, BACKHAUSS, HENNING
On an employer assignment, the assignors are typically the inventors.