LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

Patent №

US 7,199,858

Granted

2007-04-03

Filed 2003

Owner

ASML NETHERLANDS B.V.

Lab

AI components

1

planning

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

10705804

A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.

PlanningG03F 7/70341G03F 7/707G03F 7/7085G03F 7/70866

AI classification

Planning0.89
Natural language0.01
Evolutionary computation0.00
Knowledge representation0.00
AI hardware0.00
Speech0.00
Machine learning0.00
Vision0.00

Ownership

ASML NETHERLANDS B.V.

assignment · 153140396

Assignors

LOF, JOERI, BUTLER, HANS, HOOGENDAM, CHRISTIAAN ALEXANDER, LOOPSTRA, ERIK ROELOF, BIJLAART, ERIK THEODORUS MARIA, DONDERS, SJOERD NICOLAAS LAMBERTUS, KOLESNYCHENKO, ALEKSEY, MEIJER, HENDRICUS JOHANNES MARIA

On an employer assignment, the assignors are typically the inventors.

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