METHODS AND APPARATUS FOR LOW DISTORTION PARAMETER MEASUREMENTS

Patent №

US 7,299,148

Granted

2007-11-20

Filed 2005

Owner

ONWAFER TECHNOLOGIES, INC.

+1 more

Lab

AI components

1

planning

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

11177922

This invention seeks to provide methods and apparatus that can improve the accuracy of measured parameter data used for processing workpieces. One aspect of the present invention includes methods of measuring process conditions with low distortion of the measurements caused by the measuring apparatus. The measurements include data for applications such as data for monitoring, controlling, and optimizing processes and process tools. Another aspect of the present invention includes apparatus for measuring substantially correct data for applications such as generating data for monitoring, controlling, and optimizing processes and process tools.

PlanningG01K 1/18H05K 1/147H05K 1/148

AI classification

Planning0.96
Machine learning0.00
Natural language0.00
Speech0.00
AI hardware0.00
Evolutionary computation0.00
Knowledge representation0.00
Vision0.00

Ownership

ONWAFER TECHNOLOGIES, INC.

assignment · 187640061

KLA-TENCOR CORPORATION

merger · 204170596

Assignors

HUNT, DEAN, SPANOS, COSTAS J., WELCH, MICHAEL, POOLLA, KAMESHWAR, FREED, MASON L.

On an employer assignment, the assignors are typically the inventors.

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