Patent №
US 7,308,673
Granted
2007-12-11
Filed 2005
Owner
SYNOPSYS, INC.
Lab
—
AI components
1
hardware
Assignment
Recorded
Dataset
AIPD
2023_r1 edition
Application
11033415
One embodiment of the present invention provides a system that improves lithography performance by correcting for 3D mask effects. During operation the system receives a mask layout that contains etched regions, called shifters, which can have a phase shift relative to other regions. Next, the system chooses a shifter in the mask layout. The system then corrects for 3D mask effects by, iteratively, (a) selecting a region within the shifter, (b) adjusting the phase shift of the selected region in a simulation model to account for 3D mask effects, and (c) modifying the shape of the shifter based on the difference between a desired pattern and a simulated pattern generated using the simulation model.
AI classification
Ownership
SYNOPSYS, INC.
assignment · 161590468
Assignors
MELVIN, LAWRENCE S. III., YAN, QILIANG, SHIELY, JAMES P.
On an employer assignment, the assignors are typically the inventors.