Patent US 7,403,291

An adjusting method measures a wavefront aberration in a first direction of a target optical system and a wavefront aberration in a second direction different from the first direction of the target optical system, and calculates a first correction value and a second correction value based on a determinant assuming that a matrix that is made by adding a first correction value to each column of the first matrix is equal to a matrix that is made by adding a second correction value to each row of the second matrix. The first correction value is different every column, and the second correction value is different every row. The first matrix represents the wavefront aberration in the first direction, and the second matrix represents the wavefront aberration in the second direction. The adjusting method obtains a two-dimensional wavefront aberration of the target optical system by calculating the matrix that is made by adding the first correction value that has been calculated to the first matrix and/or the matrix that is made by adding the second correction value that has been calculated to the second matrix, and adjusts the target optical system based on the obtained two-dimensional wavefront aberration.