CIRCUIT-PATTERN INSPECTING APPARATUS AND METHOD

Patent №

US 7,423,746

Granted

2008-09-09

Filed 2007

Owner

HITACHI HIGH-TECHNOLOGIES

Lab

AI components

2

vision · planning

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

11698985

A circuit pattern inspection apparatus and inspection method facilitate the creation of a recipe and the confirmation of a defect. The apparatus and method employ a dialogue-based operation for the creation of a recipe and the confirmation of a defect. Input items (such as contrast, calibration, etc.) for the recipe creation and their purposes are clarified. Input items (such as clustering, filtering, etc.) for the defect confirmation and their purposes are also clarified. The results obtained on the basis of these inputs are registered in the recipe.

VisionPlanningG01N 21/95607G01N 2021/9513G01N 2021/95676

AI classification

Planning0.98
Vision0.98
AI hardware0.28
Machine learning0.08
Natural language0.02
Knowledge representation0.01
Evolutionary computation0.00
Speech0.00

Ownership

HITACHI HIGH-TECHNOLOGIES

assignment · 191690546

Assignors

TAKEDA, MASAYOSHI, ITO, HIROKAZU

On an employer assignment, the assignors are typically the inventors.

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