OUTLIER SUBSTRATE INSPECTION

Patent №

US 7,440,607

Granted

2008-10-21

Filed 2004

Owner

KLA-TENCOR TECHNOLOGIES CORPORATION

Lab

AI components

4

ml · vision · kr · planning

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

10980499

A method of detecting anomalies in a test image. Test features of pixels within the test image are selected, and reference features of pixels within at least one reference image are also selected. A signal distribution of test features and reference features in a multi-dimensional feature space is created, and stored. Those test features of the test image that do not satisfy a set of criteria for normalcy are selected as candidate points. Those candidate points that are statistical outliers are identified as anomalies. Positions of the anomalies are located using the stored signal distribution within which the defects have been identified as a lookup table.

Machine learningVisionKnowledge representationPlanningG01N 21/8851G06T 7/0004G01N 21/95607G01N 2021/8825G01N 2021/8887

AI classification

Vision1.00
Planning0.99
Machine learning0.96
Knowledge representation0.91
AI hardware0.01
Natural language0.00
Evolutionary computation0.00
Speech0.00

Ownership

KLA-TENCOR TECHNOLOGIES CORPORATION

assignment · 159690184

Assignors

LIN, JASON Z., CHEN, HONG, SHIFRIN, EVGENI, KULKARNI, ASHOK V., BHATTACHARYYA, SANTOSH K., ZHAO, WEI, CHEN, CHIEN-HUEI

On an employer assignment, the assignors are typically the inventors.

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