DUAL-PHASE VIRTUAL METROLOGY METHOD

Patent №

US 7,603,328

Granted

2009-10-13

Filed 2007

Owner

NATIONAL CHENG KUNG UNIVERSITY

Lab

AI components

3

planning · evo · hardware

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

11879562

A dual-phase virtual metrology method is disclosed for considering both promptness and accuracy by generating dual-phase virtual metrology (VM) values, wherein a Phase-I conjecture step emphasizes promptness by immediately calculating the Phase-I virtual metrology value (VMI) of a workpiece once the entire process data of the workpiece are completely collected; and a Phase-II conjecture step intensifies accuracy, which does not re-calculate the Phase-II virtual metrology values (VMII) of all the workpieces in the cassette until an actual metrology value (required for tuning or re-training purposes) of a selected workpiece in the same cassette is collected. Besides, the accompanying reliance index (RI) and global similarity index (GSI) of each VMI and VMII are also generated.

PlanningEvolutionary computationAI hardwareG05B 19/41875G05B 2219/32191G05B 2219/32195G05B 2219/32206G05B 2219/37224Y02P 90/02

AI classification

Planning1.00
AI hardware0.80
Evolutionary computation0.65
Vision0.25
Machine learning0.17
Knowledge representation0.07
Natural language0.00
Speech0.00

Ownership

NATIONAL CHENG KUNG UNIVERSITY

assignment · 196320312

Assignors

CHENG, FAN-TIEN, HUANG, HSIEN-CHENG, KAO, CHI-AN

On an employer assignment, the assignors are typically the inventors.

From the same owner

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