Patent №
US 7,603,328
Granted
2009-10-13
Filed 2007
Owner
NATIONAL CHENG KUNG UNIVERSITY
Lab
—
AI components
3
planning · evo · hardware
Assignment
Recorded
Dataset
AIPD
2023_r1 edition
Application
11879562
A dual-phase virtual metrology method is disclosed for considering both promptness and accuracy by generating dual-phase virtual metrology (VM) values, wherein a Phase-I conjecture step emphasizes promptness by immediately calculating the Phase-I virtual metrology value (VMI) of a workpiece once the entire process data of the workpiece are completely collected; and a Phase-II conjecture step intensifies accuracy, which does not re-calculate the Phase-II virtual metrology values (VMII) of all the workpieces in the cassette until an actual metrology value (required for tuning or re-training purposes) of a selected workpiece in the same cassette is collected. Besides, the accompanying reliance index (RI) and global similarity index (GSI) of each VMI and VMII are also generated.
AI classification
Ownership
NATIONAL CHENG KUNG UNIVERSITY
assignment · 196320312
Assignors
CHENG, FAN-TIEN, HUANG, HSIEN-CHENG, KAO, CHI-AN
On an employer assignment, the assignors are typically the inventors.