WAFER EDGE INSPECTION AND METROLOGY

Patent №

US 7,616,804

Granted

2009-11-10

Filed 2006

Owner

RUDOLPH TECHNOLOGIES, INC.

Lab

AI components

1

vision

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

11525530

Some aspects of the present invention relate to a wafer inspection method. A plurality of images is acquired about an edge portion of a wafer. Each of the images comprises a pixel array having a first dimension and a second dimension. A composite image of compressed pixel arrays is generated by compressing each of the pixel arrays in the first dimension and concatenating the pixel arrays. The composite image is analyzed to identify a wafer feature, for example using a sinusoidal line fit.

VisionG01N 21/9501G01N 21/9503

AI classification

Vision1.00
Planning0.01
Machine learning0.00
Natural language0.00
AI hardware0.00
Speech0.00
Evolutionary computation0.00
Knowledge representation0.00

Ownership

RUDOLPH TECHNOLOGIES, INC.

assignment · 185510271

Assignors

PAI, AJAY, LE, TUAN D.

On an employer assignment, the assignors are typically the inventors.

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