PATTERN SHAPE EVALUATION METHOD AND PATTERN SHAPE EVALUATION APPARATUS UTILIZING THE SAME
Patent №
US 8,019,149
Granted
2011-09-13
Filed 2009
Owner
KABUSHIKI KAISHA TOSHIBA
Lab
—
AI components
2
vision · evo
Assignment
Recorded
Dataset
AIPD
2023_r1 edition
Application
12562173
A pattern shape evaluation method for deciding whether a pair of patterns are disconnected or connected. The method includes extracting a plurality of pattern contour points that make up a contour of a pattern in a measurement region, and creating two pattern contour point sequences based on the plurality of pattern contour points. Each of the two pattern contour point sequences includes a set of the pattern contour points. In the pattern contour point sequence, each of distances between neighboring pattern contour points is equal to or smaller than a predetermined value. The method includes calculating an angle between a line passing through two of the pattern contour points which provide a shortest distance between the two pattern contour point sequences and a reference line arbitrarily defined with respect to the measurement region. The method further includes deciding whether the patterns are disconnected or connected, based on the angle.
AI classification
Ownership
KABUSHIKI KAISHA TOSHIBA
assignment · 232500305
Assignors
ABE, HIDEAKI, MITSUI, TADASHI
On an employer assignment, the assignors are typically the inventors.