PATTERN DISCOVERY TECHNIQUES FOR DETERMINING MAXIMAL IRREDUNDANT AND REDUNDANT MOTIFS

Patent №

US 8,024,130

Granted

2011-09-20

Filed 2009

Owner

S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES S.A.

Lab

AI components

4

vision · kr · evo · hardware

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

12533221

Basis motifs are determined from an input sequence through an iterative technique that begins by creating small solid motifs and continues to create larger motifs that include “don't care” characters and that can include flexible portions. The small solid motifs, including don't care characters and flexible portions, are concatenated to create larger motifs. During each iteration, motifs are trimmed to remove redundant motifs and other motifs that do not meet certain criteria. The process is continued until no new motifs are determined. At this point, the basis set of motifs has been determined. The basis motifs are used to construct redundant motifs. The redundant motifs are formed by determining a number of sets for selected basis motifs. From these sets, unique intersection sets are determined. The redundant motifs are determined from the unique intersection sets and the basis motifs. This process continues, by selecting additional basis motifs, until all basis motifs have been selected.

AI classification

Knowledge representation1.00
Evolutionary computation0.99
Vision0.92
AI hardware0.83
Planning0.36
Machine learning0.01
Natural language0.00
Speech0.00

Ownership

S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES S.A.

assignment · 277850722

Assignors

FAURE, BRUCE, LETERTRE, FABRICE

On an employer assignment, the assignors are typically the inventors.

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