METHOD OF PREDICTING SUBSTRATE CURRENT IN HIGH VOLTAGE DEVICE

Patent №

US 8,028,261

Granted

2011-09-27

Filed 2008

Owner

DONGBU HITEK CO., LTD.

+1 more

Lab

AI components

1

planning

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

12344383

A method of predicting a substrate current in a high voltage device that may accurately predict substrate current components in each of a first region, a second region, and a third region. This may be accomplished by modeling a substrate current component in a third region, in which an inconsistency may occur when a substrate current in a high voltage device is calculated, for example using BSIM3-based modeling. According to embodiments, a substrate current for a third region may be modeled by an expression with a ternary operator, and the modeled substrate current may be added to a substrate current obtained through BSIM3-based modeling.

AI classification

Planning0.85
Machine learning0.01
Evolutionary computation0.01
Vision0.00
AI hardware0.00
Natural language0.00
Knowledge representation0.00
Speech0.00

Ownership

DONGBU HITEK CO., LTD.

assignment · 226330496

INPHI CORPORATION

assignment · 412620699

Assignors

KWAK, SANG-HUN

On an employer assignment, the assignors are typically the inventors.

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