ULTRAFINE PATTERN DISCRIMINATION USING TRANSMITTED/REFLECTED WORKPIECE IMAGES FOR USE IN LITHOGRAPHY INSPECTION SYSTEM
Patent №
US 8,094,926
Granted
2012-01-10
Filed 2009
Owner
ADVANCED MASK INSPECTION TECHNOLOGY, INC.
Lab
—
AI components
1
vision
Assignment
Recorded
Dataset
AIPD
2023_r1 edition
Application
12392545
A technique for discriminating a specific pattern, such as an assist pattern, from an integrate circuit pattern of a workpiece by using transmission and reflection images of the workpiece pattern is disclosed. A pattern discrimination device includes an optical image acquisition unit for acquiring a transmissive image of a workpiece having a pattern and a reflective image of the workpiece pattern simultaneously, and a specific pattern detection unit which detects for extraction a specific pattern from among pattern shapes of the transmissive and reflective images in conformity with a distinguishing condition of the specific pattern. A workpiece pattern inspection apparatus using the device is also disclosed.
AI classification
Ownership
ADVANCED MASK INSPECTION TECHNOLOGY, INC.
assignment · 223250024
Assignors
HARABE, NOBUYUKI
On an employer assignment, the assignors are typically the inventors.