ULTRAFINE PATTERN DISCRIMINATION USING TRANSMITTED/REFLECTED WORKPIECE IMAGES FOR USE IN LITHOGRAPHY INSPECTION SYSTEM

Patent №

US 8,094,926

Granted

2012-01-10

Filed 2009

Owner

ADVANCED MASK INSPECTION TECHNOLOGY, INC.

Lab

AI components

1

vision

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

12392545

A technique for discriminating a specific pattern, such as an assist pattern, from an integrate circuit pattern of a workpiece by using transmission and reflection images of the workpiece pattern is disclosed. A pattern discrimination device includes an optical image acquisition unit for acquiring a transmissive image of a workpiece having a pattern and a reflective image of the workpiece pattern simultaneously, and a specific pattern detection unit which detects for extraction a specific pattern from among pattern shapes of the transmissive and reflective images in conformity with a distinguishing condition of the specific pattern. A workpiece pattern inspection apparatus using the device is also disclosed.

VisionG01N 21/95607G06T 7/001G06T 7/12G01N 2021/95676G02F 1/1309G06T 2207/30148

AI classification

Vision1.00
Evolutionary computation0.04
Knowledge representation0.00
Natural language0.00
AI hardware0.00
Machine learning0.00
Planning0.00
Speech0.00

Ownership

ADVANCED MASK INSPECTION TECHNOLOGY, INC.

assignment · 223250024

Assignors

HARABE, NOBUYUKI

On an employer assignment, the assignors are typically the inventors.

© 2026 NYSGPT2525 LLC