SYSTEM AND TECHNIQUE FOR MODELING RESIST PROFILE CHANGE SENSITIVITY AT DIFFERENT HEIGHTS

A method of calibrating a compact model for a lithographic process is described. In this method, the nominal compact model can be provided. Notably, an input energy effect can be separated from chemical effects and other factors regarding the photoresist. Using a processor, the compact model can be calibrated based on the input energy, thereby generating an energy-sensitive compact model. The energy-sensitive compact model can quickly construct 3D resist profiles capturing resist profile degradation at any horizontal plane. Because this method does not change any form of compact modeling, it can be integrated as is into validation and correction processes. In other embodiments, the energy-sensitive compact model can be further calibrated based on one or more of the chemical effects and/or other factors.