DEFECT INSPECTION METHOD AND DEVICE THEREFOR

Patent №

US 9,239,283

Granted

2016-01-19

Filed 2013

Owner

HITACHI HIGH-TECHNOLOGIES CORPORATION

Lab

AI components

1

vision

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

13993888

To process a signal from a plurality of detectors without being affected by a variation in the height of a substrate, and to detect more minute defects on the substrate, a defect inspection device is provided with a photoelectric converter having a plurality of rows of optical sensor arrays in each of first and second light-collecting/detecting unit and a processing unit for processing a detection signal from the first and the second light-collecting/detecting unit to determine the extent to which the positions of the focal points of the first and the second light-collecting/detecting unit are misaligned with respect to the surface of a test specimen, and processing the detection signal to correct a misalignment between the first and the second light-collecting/detecting unit, and the corrected detection signal outputted from the first and the second light-collecting/detecting unit are combined together to detect the defects on the test specimen.

VisionG01N 21/00G01N 21/8851G01N 21/9501G01N 21/956G01N 2021/8896

AI classification

Vision0.88
Evolutionary computation0.02
Natural language0.00
Knowledge representation0.00
Speech0.00
AI hardware0.00
Machine learning0.00
Planning0.00

Ownership

HITACHI HIGH-TECHNOLOGIES CORPORATION

assignment · 308720728

Assignors

HONDA, TOSHIFUMI, SHIBATA, YUKIHIRO, TANIGUCHI, ATSUSHI

On an employer assignment, the assignors are typically the inventors.

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