Patent №
US 9,458,010
Granted
2016-10-04
Filed 2015
Owner
FREESCALE SEMICONDUCTOR, INC.
Lab
—
AI components
1
planning
Assignment
Recorded
Dataset
AIPD
2023_r1 edition
Application
14805924
A method of making a semiconductor device forms anchors for one or more layers of material. The method includes depositing a first layer of material on a substrate, applying a mask over the first layer of material to mask nanoparticle-sized areas of the first material, removing portions of the first layer of material to form a first set of recesses around the nanoparticle-sized areas of the first material, depositing a second layer of material in the recesses and over the nanoparticle-sized areas so that a second set of recesses is formed in a top surface of the second layer of material, and forming a component of the semiconductor device over the second layer of material. Material of a bottom surface of the component is included in the second set of recesses.
AI classification
Ownership
FREESCALE SEMICONDUCTOR, INC.
assignment · 361540221
Assignors
MONTEZ, RUBEN B., STEIMLE, ROBERT F.
On an employer assignment, the assignors are typically the inventors.