SYSTEMS AND METHODS FOR ANCHORING COMPONENTS IN MEMS SEMICONDUCTOR DEVICES

Patent №

US 9,458,010

Granted

2016-10-04

Filed 2015

Owner

FREESCALE SEMICONDUCTOR, INC.

Lab

AI components

1

planning

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

14805924

A method of making a semiconductor device forms anchors for one or more layers of material. The method includes depositing a first layer of material on a substrate, applying a mask over the first layer of material to mask nanoparticle-sized areas of the first material, removing portions of the first layer of material to form a first set of recesses around the nanoparticle-sized areas of the first material, depositing a second layer of material in the recesses and over the nanoparticle-sized areas so that a second set of recesses is formed in a top surface of the second layer of material, and forming a component of the semiconductor device over the second layer of material. Material of a bottom surface of the component is included in the second set of recesses.

PlanningB81C 1/00039B81B 2203/0307B81C 2201/0197

AI classification

Planning0.87
Vision0.01
Evolutionary computation0.01
AI hardware0.00
Natural language0.00
Machine learning0.00
Knowledge representation0.00
Speech0.00

Ownership

FREESCALE SEMICONDUCTOR, INC.

assignment · 361540221

Assignors

MONTEZ, RUBEN B., STEIMLE, ROBERT F.

On an employer assignment, the assignors are typically the inventors.

From the same owner

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