INPUT/OUTPUT (I/O) DEVICES WITH GREATER SOURCE/DRAIN PROXIMITY THAN NON-I/O DEVICES

Patent №

US 10,074,668

Granted

2018-09-11

Filed 2017

Owner

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

Lab

AI components

1

planning

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

15622648

A semiconductor device includes a first FinFET device and a second FinFET device. The first FinFET device includes a first gate, a first source, and a first drain. The first FinFET device has a first source/drain proximity. The second FinFET device includes a second gate, a second source, and a second drain. The second FinFET device has a second source/drain proximity that is smaller than the first source/drain proximity. In some embodiments, \the first FinFET device is an Input/Output (I/O) device, and the second FinFET device is a non-I/O device such as a core device. In some embodiments, the greater source/drain proximity of the first FinFET device is due to an extra spacer of the first FinFET device that does not exist for the second FinFET device.

PlanningH10D 84/907H10D 30/0241H10D 30/6211H10D 62/151H10D 64/017H10D 84/0147H10D 84/0158H10D 84/038+10 more

AI classification

Planning0.97
AI hardware0.09
Machine learning0.01
Knowledge representation0.00
Natural language0.00
Evolutionary computation0.00
Speech0.00
Vision0.00

Ownership

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

assignment · 427070311

Assignors

CHING, KUO-CHENG, TSAI, CHING-WEI, WANG, CHIH-HAO, LEUNG, YING-KEUNG

On an employer assignment, the assignors are typically the inventors.

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