INPUT/OUTPUT (I/O) DEVICES WITH GREATER SOURCE/DRAIN PROXIMITY THAN NON-I/O DEVICES
Patent №
US 10,074,668
Granted
2018-09-11
Filed 2017
Owner
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Lab
—
AI components
1
planning
Assignment
Recorded
Dataset
AIPD
2023_r1 edition
Application
15622648
A semiconductor device includes a first FinFET device and a second FinFET device. The first FinFET device includes a first gate, a first source, and a first drain. The first FinFET device has a first source/drain proximity. The second FinFET device includes a second gate, a second source, and a second drain. The second FinFET device has a second source/drain proximity that is smaller than the first source/drain proximity. In some embodiments, \the first FinFET device is an Input/Output (I/O) device, and the second FinFET device is a non-I/O device such as a core device. In some embodiments, the greater source/drain proximity of the first FinFET device is due to an extra spacer of the first FinFET device that does not exist for the second FinFET device.
AI classification
Ownership
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
assignment · 427070311
Assignors
CHING, KUO-CHENG, TSAI, CHING-WEI, WANG, CHIH-HAO, LEUNG, YING-KEUNG
On an employer assignment, the assignors are typically the inventors.