Patent №
US 11,614,690
Granted
2023-03-28
Filed 2019
Owner
ASML NETHERLANDS B.V.
Lab
—
AI components
2
planning · evo
Assignment
Recorded
Dataset
AIPD
2023_r1 edition
Application
16478489
Methods of constructing a process model for simulating a characteristic of a product of lithography from patterns produced under different processing conditions. The methods use a deviation between the variation of the simulated characteristic and the variation of the measured characteristic to adjust a parameter of the process model.
PlanningEvolutionary computationG03F 7/705G03F 7/70441G05B 19/41875G05B 2219/33286G05B 2219/45028G05B 2219/49087
AI classification
Planning0.91
Evolutionary computation0.79
Knowledge representation0.10
Machine learning0.05
AI hardware0.01
Natural language0.00
Speech0.00
Vision0.00
Ownership
ASML NETHERLANDS B.V.
assignment · 497730885
Assignors
FENG, MU, SHAYEGAN SALEK, MIR FARROKH, ZHU, DIANWEN, ZHENG, LEIWU, HOWELL, RAFAEL C., WANG, JEN-SHIANG
On an employer assignment, the assignors are typically the inventors.
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