PHOTOMASK INSPECTION METHOD AND APPARATUS THEREOF

Patent №

US 11,614,684

Granted

2023-03-28

Filed 2021

Owner

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.

Lab

AI components

2

vision · planning

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

17200867

A method includes: receiving a photomask; patterning a wafer by directing a first radiation beam to the wafer through the photomask at a first tilt angle; and inspecting the photomask. The inspecting includes: directing a second radiation beam to the photomask at a second tilt angle greater than the first tilt angle; receiving a third radiation beam reflected from the photomask; and generating an image of the photomask according to the third radiation beam.

VisionPlanningG03F 1/84G03F 1/24G03F 7/702G03F 7/70608

AI classification

Vision0.98
Planning0.98
Natural language0.49
Knowledge representation0.00
Speech0.00
Evolutionary computation0.00
AI hardware0.00
Machine learning0.00

Ownership

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.

assignment · 555840682

Assignors

WEN, CHIH-WEI, TSENG, HSIN-FU, CHEN, CHIEN-LIN

On an employer assignment, the assignors are typically the inventors.

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