PATTERN INSPECTION METHOD

Patent №

US 4,776,023

Granted

1988-10-04

Filed 1986

Owner

HITACHI, LTD., A CORP OF JAPAN

Lab

AI components

1

vision

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

06850681

Two kinds of image corresponding to a reference pattern and a pattern to be inspected are converted into binary images and local images cut out from the binary images are compared with each other to detect differences between the cut out images and recognize these differences as a defect. One of the main subjects of the inspecting method is to moderate excess sensitivity to the different portions to the extent of allowing non-serious actual defects. By setting don't care areas each of which consists of one pixel row neighboring on a binary boundary line in the image, and comparing the remaining portions of the images other than the don't care areas by logical processing it is possible to detect various defects without regarding the quantization error as a defect.

VisionG06T 7/001G01N 21/95607G06T 2207/30148

AI classification

Vision1.00
Planning0.02
AI hardware0.00
Natural language0.00
Machine learning0.00
Evolutionary computation0.00
Knowledge representation0.00
Speech0.00

Ownership

HITACHI, LTD., A CORP OF JAPAN

assignment · 45410694

Assignors

HAMADA, TOSHIMITSU, NOMOTO, MINEO, NAKAHATA, KOZO

On an employer assignment, the assignors are typically the inventors.

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