Patent №
US 4,847,792
Granted
1989-07-11
Filed 1987
Owner
TEXAS INSTRUMENTS INCORPORATED, A CORP OF DE.
Lab
—
AI components
1
planning
Assignment
Recorded
Dataset
AIPD
2023_r1 edition
Application
07046497
An apparatus and process for detecting aberrations in production process operations is provided. In one embodiment, operations of a plasma etch reactor (10) are monitored to detect aberrations in etching operations. A reference end-point trace (EPT) is defined (50), regions are defined in the reference EPT (52) and characteristics and tolerances for each region are defined (54). The etcher is run (56) and an actual EPT is obtained from the running of the etcher. The actual EPT is analyzed (58) by comparing characteristics of the regions of the actual EPT with characteristics of corresponding regions of the reference EPT. If the characteristics of the actual EPT exceed those of the reference EPT by predefined tolerances (62) a signal is generated (68). The system also checks for aberrations which are manifested by predefined EPT characteristics and signals when those are detected.
AI classification
Ownership
TEXAS INSTRUMENTS INCORPORATED, A CORP OF DE.
assignment · 47130266
Assignors
BARNA, GABRIEL G., RATLIFF, CHARLES
On an employer assignment, the assignors are typically the inventors.