LITHOGRAPHIC PROCESS ANALYSIS AND CONTROL SYSTEM

Patent №

US 4,890,239

Granted

1989-12-26

Filed 1987

Owner

SHIPLEY COMPANY INC., MASSACHUSETTS A MASSACHUSETTS CORP.

Lab

—

AI components

planning

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

07110905

A lithographic process analysis and control system which provides a modeled verison of a lithographic process in the dimensions of feature width, focus and exposure. This system uses the model to quickly determine the range of focus and exposure limits for obtaining the desired feature width. The system has flexible graphic display capability for displaying graphic representations of the data as measured and modeled.

PlanningG03F 7/70558G03F 7/70641G03F 7/708

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Planning1.00

AI hardware0.02

Natural language0.01

Knowledge representation0.01

Machine learning0.00

Evolutionary computation0.00

Vision0.00

Speech0.00

Ownership

SHIPLEY COMPANY INC., MASSACHUSETTS A MASSACHUSETTS CORP.

assignment · 48020269

Assignors

MCFADDEN, EDWARD, A.,, TAN, RAUL, V.,, AUSSCHNITT, CHRISTOPHER P.

On an employer assignment, the assignors are typically the inventors.

Cited by (20)

PROCESS WINDOW IDENTIFIERUS 11,379,648 · 2022 PROCESS WINDOW IDENTIFIERUS 10,755,025 · 2020 SYSTEM AND METHOD OF PREDICTING PROBLEMATIC AREAS FOR LITHOGRAPHY IN A CIRCUIT DESIGNUS 9,075,944 · 2015 SYSTEM AND METHOD OF PREDICTING PROBLEMATIC AREAS FOR LITHOGRAPHY IN A CIRCUIT DESIGNUS 8,484,586 · 2013 METHOD AND APPARATUS FOR DETERMINING AN OPTICAL THRESHOLD AND A RESIST BIASUS 8,184,897 · 2012 LITHOGRAPHIC PROCESSING OPTIMIZATION BASED ON HYPERSAMPLED CORRELATIONSUS 8,120,748 · 2012 METHOD AND SYSTEM FOR RECONSTRUCTING ABERRATED IMAGE PROFILES THROUGH SIMULATIONUS 8,027,813 · 2011 FOCUS BLUR MEASUREMENT AND CONTROL METHODUS 7,439,001 · 2008 OVERLAY TARGET AND MEASUREMENT METHOD USING REFERENCE AND SUB-GRIDSUS 7,359,054 · 2008 COMPUTER-IMPLEMENTED METHOD AND CARRIER MEDIUM CONFIGURED TO GENERATE A SET OF PROCESS PARAMETERS AND/OR A LIST OF POTENTIAL CAUSES OF DEVIATIONS FOR A LITHOGRAPHY PROCESSUS 7,142,941 · 2006 ADAPTIVE VALUE GENERATING APPARATUS, ADAPTIVE PROCEDURE CONTROL PROGRAM, AND ADAPTIVE VALUE GENERATING PROGRAMUS 6,944,508 · 2005 OVERLAY TARGET AND MEASUREMENT METHOD USING REFERENCE AND SUB-GRIDSUS 6,937,337 · 2005 APPARATUS AND METHODS FOR GENERATING AN INSPECTION REFERENCE PATTERNUS 6,691,052 · 2004 APPARATUS AND METHODS FOR MODELING PROCESS EFFECTS AND IMAGING EFFECTS IN SCANNING ELECTRON MICROSCOPYUS 6,581,193 · 2003 SYSTEM AND METHOD FOR MONITORING AND IMPROVING DIMENSIONAL STABILITY AND REGISTRATION ACCURACY OF MULTI-LAYER PCB MANUFACTUREUS 6,581,202 · 2003 SEMICONDUCTOR PROCESSING TECHNIQUESUS 6,556,949 · 2003 SEMICONDUCTOR PROCESSING TECHNIQUESUS 6,456,894 · 2002 METHOD AND SYSTEM FOR OPTIMIZING ILLUMINATION IN AN OPTICAL PHOTOLITHOGRAPHY PROJECTION IMAGING SYSTEMUS 5,680,588 · 1997 METHOD AND APPARATUS FOR DETERMINING A FEATURE-FORMING VARIANT OF A LITHOGRAPHIC SYSTEMUS 5,331,370 · 1994 Patent US 6,408,220US 6,408,220

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