Patent №
US 5,282,925
Granted
1994-02-01
Filed 1992
Owner
INTERNATIONAL BUSINESS MACHINES CORP.
+1 more
Lab
AI components
1
hardware
Assignment
Recorded
Dataset
AIPD
2023_r1 edition
Application
07973380
New device and method are described for accurate etching and removal of thin layer by controlling the surface residence time, thickness and composition of reactant containing film. Etching of silicon dioxide at low pressure using a quartz crystal microbalance is illustrated. Usefulness of the invention in the manufacture of microelectronic devices is shown.
AI classification
Ownership
INTERNATIONAL BUSINESS MACHINES CORP.
assignment · 63740022
TOKYO ELECTRON LIMITED
assignment · 211380886
Assignors
JENG, SHWU-JEN, NATZLE, WESLEY C., YU, CHIENFAN
On an employer assignment, the assignors are typically the inventors.