PATTERN INSPECTION METHOD AND SYSTEM

Patent №

US 6,064,484

Granted

2000-05-16

Filed 1997

Owner

FUJITSU LIMITED

Lab

AI components

1

vision

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

08814414

A pattern inspection method includes the steps of: obtaining first image data by optically picking up an actually formed pattern such as a reticle; aligning a position of the first image data with second image data of a pattern at a different layer from that of the first image data; and performing a first pattern inspection using the first and second image data. Defect inspection can be executed in a short time with a practically sufficient precision.

VisionG01B 11/00G01N 21/95607G06T 7/0006G06T 7/001G06T 2207/30148

AI classification

Vision1.00
Natural language0.00
Evolutionary computation0.00
Speech0.00
Planning0.00
Machine learning0.00
AI hardware0.00
Knowledge representation0.00

Ownership

FUJITSU LIMITED

assignment · 84270551

Assignors

KOBAYASHI, KEN-ICHI, MATSUYAMA, TAKAYOSHI, MATSUI, SHOWGO

On an employer assignment, the assignors are typically the inventors.

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