Patent US 9,529,279

Patent №

US 9,529,279

Granted

—

Owner

—

Lab

—

AI components

vision

Assignment

None on record

Dataset

AIPD

2023_r1 edition

Application

11542785

View graph

A method and apparatus for inspection and review of defects is disclosed wherein data gathering is improved. In one embodiment, multiple or segmented detectors are used in a particle beam system.

VisionG01N 23/203G01N 21/956G01N 21/95607G01N 23/20G01N 23/2251G01N 23/2252G03F 1/84G03F 1/86+8 more

Google Patents

AI classification

Vision0.79

Evolutionary computation0.01

Natural language0.01

Machine learning0.00

Speech0.00

AI hardware0.00

Knowledge representation0.00

Planning0.00

Cites (3)

PATTERN INSPECTION METHOD AND SYSTEMUS 6,064,484 · 2000 PATTERN INSPECTION APPARATUS AND ELECTRON BEAM APPARATUSUS 5,557,105 · 1996 INSPECTION METHOD AND APPARATUS FOR THE INSPECTION OF EITHER RANDOM OR REPEATING PATTERNSUS 5,537,669 · 1996

Related research

Deep learning-based defect detection using large FOV SEM for 28 nm pitch BEOL layer patterned with 0.33NA single exposure EUVSemantic Scholar Inline Inspection Improvement using Machine Learning on Broadband Plasma Inspector in an Advanced Foundry FabSemantic Scholar Review of image segmentation techniques for layup defect detection in the Automated Fiber Placement processSemantic Scholar Sub-Pixel Electron Beam Alignment for Machine Learning Characterization of Hybrid Pixel DetectorsarXiv Classification of periodical defects in inspection systems based on computer visionSemantic Scholar

Full text

Google Patents