Patent №
US 6,603,543
Granted
2003-08-05
Filed 2001
Owner
ADVANCED MICRO DEVICES, INC.
Lab
—
AI components
1
hardware
Assignment
Recorded
Dataset
AIPD
2023_r1 edition
Application
09774000
An inspection tool or inspection system can be utilized to determine whether the appropriate pattern is on a reticle. The reticle can be associated with EUV lithographic tools. The system can utilize at least two pulse durations of light or an ultra-short pulse duration of light. The light is directed to the reticle and received by a detector.
AI classification
AI hardware0.50
Evolutionary computation0.04
Natural language0.01
Knowledge representation0.00
Vision0.00
Speech0.00
Machine learning0.00
Planning0.00
Ownership
ADVANCED MICRO DEVICES, INC.
assignment · 115500253
Assignors
LA FONTAINE, BRUNO M.
On an employer assignment, the assignors are typically the inventors.
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