Patent №
US 6,963,395
Granted
2005-11-08
Filed 2001
Owner
REGENTS OF THE UNIVERSITY OF CALIFORNIA, THE
AI components
1
vision
Assignment
Recorded
Dataset
AIPD
2023_r1 edition
Application
09902502
An apparatus and method for at-wavelength EUV mask-blank characterization for inspection of moderate and low spatial frequency coating uniformity using a synchrotron or other source of EUV light. The apparatus provides for rapid, non-destruction, non-contact, at-wavelength qualification of large mask areas, and can be self-calibrating or be calibrated to well-characterized reference samples. It can further check for spatial variation of mask reflectivity or for global differences among masks. The apparatus and method is particularly suited for inspection of coating uniformity and quality and can detect defects in the order of 50 μm and above.
AI classification
Ownership
REGENTS OF THE UNIVERSITY OF CALIFORNIA, THE
assignment · 124790892
Assignors
GOLDBERG, KENNETH A.
On an employer assignment, the assignors are typically the inventors.