PATTERN INSPECTION METHOD, PATTERN INSPECTION APPARATUS, AND RECORDING MEDIUM WHICH RECORDS PATTERN INSPECTION PROGRAM
Patent №
US 6,603,875
Granted
2003-08-05
Filed 2000
Owner
FUJITSU LIMITED
Lab
—
AI components
1
vision
Assignment
Recorded
Dataset
AIPD
2023_r1 edition
Application
09525019
A pattern inspection method and apparatus for carrying out pattern inspection with a simple mechanical apparatus following a simple procedure are provided. A recording medium which records a pattern inspection program for carrying out the pattern inspection is also provided. The pattern inspection apparatus of the present invention includes: a first image data generator which generates first image data from a pattern image captured from a sample; a second image data generator which generates second image data by reducing the four sides of each pattern contained in the first image data; a pattern number detector which detects a first pattern number that is the number of patterns contained in the first image data, and also detects a second pattern number that is the number of patterns contained in the second image data; and a defect detector which detects a defect contained in the patterns of the sample in accordance with a result of the comparison between the first pattern number and the second pattern number.
AI classification
Ownership
FUJITSU LIMITED
assignment · 106300616
Assignors
MATSUYAMA, TAKAYOSHI, KOBAYASHI, ITUO
On an employer assignment, the assignors are typically the inventors.