PATTERN INSPECTION METHOD, PATTERN INSPECTION APPARATUS, AND RECORDING MEDIUM WHICH RECORDS PATTERN INSPECTION PROGRAM

Patent №

US 6,603,875

Granted

2003-08-05

Filed 2000

Owner

FUJITSU LIMITED

Lab

AI components

1

vision

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

09525019

A pattern inspection method and apparatus for carrying out pattern inspection with a simple mechanical apparatus following a simple procedure are provided. A recording medium which records a pattern inspection program for carrying out the pattern inspection is also provided. The pattern inspection apparatus of the present invention includes: a first image data generator which generates first image data from a pattern image captured from a sample; a second image data generator which generates second image data by reducing the four sides of each pattern contained in the first image data; a pattern number detector which detects a first pattern number that is the number of patterns contained in the first image data, and also detects a second pattern number that is the number of patterns contained in the second image data; and a defect detector which detects a defect contained in the patterns of the sample in accordance with a result of the comparison between the first pattern number and the second pattern number.

VisionG06T 7/0006G03F 1/84G03F 7/70616G06T 2207/30141

AI classification

Vision1.00
Knowledge representation0.00
Natural language0.00
Planning0.00
Speech0.00
Evolutionary computation0.00
Machine learning0.00
AI hardware0.00

Ownership

FUJITSU LIMITED

assignment · 106300616

Assignors

MATSUYAMA, TAKAYOSHI, KOBAYASHI, ITUO

On an employer assignment, the assignors are typically the inventors.

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