METHOD AND APPARATUS FOR CHARACTERIZING FEATURES FORMED ON A SUBSTRATE

Patent №

US 7,196,350

Granted

2007-03-27

Filed 2005

Owner

APPLIED MATERIALS, INC.

Lab

AI components

1

planning

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

11128133

A method and apparatus for testing and characterizing features formed on a substrate. In one embodiment, a test structure is provided that includes a test element having a first side and an opposing second side. A first set of one or more structures defining a first region having a first local density are disposed adjacent the first side of the test element. A second set of one or more structures defining a second region having a second local density are disposed adjacent the second side of the test element. A third set of one or more structures defining a third region having a first global density are disposed adjacent the first region. A fourth set of one or more structures defining a fourth region having a second global density are disposed adjacent the second region.

PlanningH01L 21/67253H10P 72/0604H01L 22/34H10P 74/277H01L 2924/0002

AI classification

Planning0.53
AI hardware0.02
Vision0.01
Evolutionary computation0.00
Natural language0.00
Knowledge representation0.00
Machine learning0.00
Speech0.00

Ownership

APPLIED MATERIALS, INC.

assignment · 162000322

Assignors

SMAYLING, MICHAEL C., YANG, SUXIE XIURU, DUANE, MICHAEL P.

On an employer assignment, the assignors are typically the inventors.

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