METHOD AND SYSTEM FOR CONTEXT-SPECIFIC MASK WRITING

Patent №

US 7,249,342

Granted

2007-07-24

Filed 2003

Owner

CADENCE DESIGN SYSTEMS, INC.

Lab

AI components

2

planning · hardware

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

10620285

A method for generating lithography marks includes generating integrated circuit design data and using context information from the integrated circuit design data to write a mask.

PlanningAI hardwareG03F 1/68G03F 1/36G03F 1/78

AI classification

Planning0.79
AI hardware0.59
Vision0.15
Natural language0.14
Machine learning0.11
Knowledge representation0.02
Speech0.00
Evolutionary computation0.00

Ownership

CADENCE DESIGN SYSTEMS, INC.

assignment · 142820211

Assignors

PACK, ROBERT C., SCHEFFER, LOUIS K.

On an employer assignment, the assignors are typically the inventors.

From the same owner

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