METHOD AND SYSTEM FOR CONTEXT-SPECIFIC MASK WRITING

Patent №

US 7,302,672

Granted

2007-11-27

Filed 2005

Owner

CADENCE DESIGN SYSTEMS, INC.

Lab

AI components

1

hardware

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

11143361

A method for generating lithography masks includes generating integrated circuit design data and using context information from the integrated circuit design data to write a mask.

AI hardwareG03F 1/68G03F 1/36G03F 1/78

AI classification

AI hardware0.86
Planning0.31
Natural language0.09
Vision0.02
Machine learning0.02
Knowledge representation0.01
Evolutionary computation0.01
Speech0.00

Ownership

CADENCE DESIGN SYSTEMS, INC.

assignment · 166600388

Assignors

PACK, ROBERT C., SCHEFFER, LOUIS

On an employer assignment, the assignors are typically the inventors.

From the same owner

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