PATTERN INSPECTION SYSTEM USING IMAGE CORRECTION SCHEME WITH OBJECT-SENSITIVE AUTOMATIC MODE SWITCHABILITY

Patent №

US 7,487,491

Granted

2009-02-03

Filed 2006

Owner

ADVANCED MASK INSPECTION TECHNOLOGY, INC.

Lab

AI components

1

vision

Assignment

Recorded

Dataset

AIPD

2023_r1 edition

Application

11360580

An image correction device for use in a pattern inspection apparatus is disclosed, which has automatic adaptability to variations in density of a pattern image of a workpiece being tested. The device is operable to identify a two-dimensional (2D) linear predictive model from the pattern image of interest and determine the amount of eccentricity of a centroid position of this model. This amount is then used to switch between a corrected pattern image due to the 2D linear prediction modeling and a corrected image that is interpolated by bicubic interpolation techniques. A pattern inspection method using the image correction technique is also disclosed.

VisionG06T 7/001G06T 2207/30164

AI classification

Vision1.00
AI hardware0.05
Planning0.04
Natural language0.00
Machine learning0.00
Evolutionary computation0.00
Knowledge representation0.00
Speech0.00

Ownership

ADVANCED MASK INSPECTION TECHNOLOGY, INC.

assignment · 176160187

Assignors

OAKI, JUNJI, SUGIHARA, SHINJI

On an employer assignment, the assignors are typically the inventors.

From the same owner

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