PATTERN INSPECTION SYSTEM USING IMAGE CORRECTION SCHEME WITH OBJECT-SENSITIVE AUTOMATIC MODE SWITCHABILITY
Patent №
US 7,487,491
Granted
2009-02-03
Filed 2006
Owner
ADVANCED MASK INSPECTION TECHNOLOGY, INC.
Lab
—
AI components
1
vision
Assignment
Recorded
Dataset
AIPD
2023_r1 edition
Application
11360580
An image correction device for use in a pattern inspection apparatus is disclosed, which has automatic adaptability to variations in density of a pattern image of a workpiece being tested. The device is operable to identify a two-dimensional (2D) linear predictive model from the pattern image of interest and determine the amount of eccentricity of a centroid position of this model. This amount is then used to switch between a corrected pattern image due to the 2D linear prediction modeling and a corrected image that is interpolated by bicubic interpolation techniques. A pattern inspection method using the image correction technique is also disclosed.
AI classification
Ownership
ADVANCED MASK INSPECTION TECHNOLOGY, INC.
assignment · 176160187
Assignors
OAKI, JUNJI, SUGIHARA, SHINJI
On an employer assignment, the assignors are typically the inventors.